Intermolecular to Present Results at ALD 2016 from its High-Throughput Experimentation Platform and State-of-the-Art ALD Technology

USA Profile Username: jon@newsinnovations.com / edit profile Intermolecular to Present Results at ALD 2016 from its High-Throughput Experimentation Platform and State-of-the-Art ALD Technology - Includes investigation of Nickel and Nickel Nitride as high work function electrode layers - Shows non-contact, site-addressable ALD for rapid development of advanced thin film stacks - Utilized Intermolecular's combinatorial ALD hardware to study H2O2 as alternate oxidant for metal oxide deposition PR Newswire SAN JOSE, Calif., July 25, 2016 SAN JOSE, Calif., July 25, 2016 /PRNewswire/ -- Intermolecular, Inc. (NASDAQ: IMI), the trusted partner in materials innovation, today announced it will present at ALD 2016 on Wednesday, July 27, 2016, in Dublin, Ireland. Nobi Fuchigami, Member of Technical Staff at Intermolecular, will review atomic layer deposition (ALD) processes for thin (<5nm) nickel and nickel nitride films using amidinate precursors for high work function electrode layers.  The experiments were performed using Intermolecular's high-throughput experimentation platform and state-of-the art ALD site-isolated and quad combi ALD reactor technology. In addition, Karl Littau, Ph.D, Senior Principal Scientist at Intermolecular, will present two posters showcasing the following: Intermolecular's ALD technology demonstrating non-contact, site addressable ALD reactions across a 300mm wafer in an ALD chamber integrated on a cluster tool. The comparison between RASIRC BRUTE™ hydrogen peroxide (H2O2) and ozone (O3) as the oxidant for zirconium oxide (ZrOx) utilizing Intermolecular Combinatorial ALD hardware. About Intermolecular, Inc. Intermolecular® is the trusted partner for advanced materials innovation. Advanced materials are at the core of innovation in the 21st century for a wide range of industries including semiconductors, consumer electronics, automotive and aerospace. With its substantial materials expertise; accelerated learning and experimentation platform; and information and analytics infrastructure, Intermolecular has a ten-year track record helping leading companies accelerate and de-risk materials innovation. "Intermolecular" and the Intermolecular logo are registered trademarks; all rights reserved. Learn more at www.intermolecular.com or follow on Twitter at @IMIMaterials. Contacts PRESS CONTACT:  Kelly Karr  Tanis Communications, Inc.  kelly.karr@taniscomm.com  +408-718-9350 Logo - http://photos.prnewswire.com/prnh/20160128/327096LOGO     SOURCE Intermolecular, Inc. Web Site: http://www.intermolecular.com Follow Us To change the settings for your profile(s) or email delivery, go to https://prnmedia.prnewswire.com/profile/?action=editProfile and select the profile you would like to edit. You can select the industries, subjects, languages, geographical areas, companies, delivery options and delivery frequencies of your choice. In addition to current press releases, you can also find archived news, corporate information, photos, tradeshow news and much more on the PR Newswire for Journalists website: https://prnmedia.prnewswire.com To contact us, email: mediasite@prnewswire.com Please do not reply to this email; this is an automatically generated message. Copyright © PR Newswire Association LLC. All Rights Reserved. A UBM plc company. Our mailing address is: 350 Hudson Street, Suite 300 New York, NY 10014-4504